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This thesis studies two different approaches for further downscaling in the CMOS technology and the flash memory devices. In the first place, we study Gd2-xScxO3 deposited by high pressure sputtering as a candidate for the third generation of hi[...]texto impreso
Lucía Mulas, María Luisa ; Pampillón Arce, María Ángela ; San Andres Serrano, Enrique ; Feijoo Guerrero, Pedro Carlos | AVS Amer Inst. Physics | 2013-01Gadolinium oxide thin films were deposited on silicon by a two-step process: high pressure sputtering from a metallic gadolinium target followed by an in situ plasma oxidation. Several plasma conditions for metal deposition and oxidation were st[...]
